Tetramethylammonium hydroxide 2,38% semiconductor grade NOVO DEVELOPER 342
Supplier: TRANSENE PC
|
Danger
|
342-GAL
342-QT
76540-992CS
175.44
USD
76540-992
76541-052
Tetramethylammonium hydroxide 2,38% semiconductor grade NOVO DEVELOPER 342
Tetramethylammonium hydroxide
Transene NOVO Developers are available in standard concentrations for controlled developing of photoresists.
Formula:
C₄H₁₃NO MW: 91.15 g/mol Boiling Pt: 102 °C Melting Pt: 0 °C Density: 1.01 Storage Temperature: Ambient |
MDL Number:
MFCD00008280 CAS Number: 75-59-2 UN: 1835 ADR: 8,II |
Specification Test Results
TMAH Concentration | 2,38 % |
Typical Development Cycle | |
Developer | 15 to 75 Seconds |
Water Rinse | 20 to 30 Seconds |
Nitrogen Dry | 15 to 20 Seconds |
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